subject: Applied Materials Company Introduced The Next Generation Of Lcd And Oled Technology [print this page] Applied Materials Company has declared, launch of a new physical vapor deposition (PVD) and plasma enhanced chemical vapor deposition (PECVD) technology, make high quality (UHD) television and high pixel density display mobile device toward a new era. This important transformation technology is the key to the new metal oxide and low temperature polycrystalline silicon (LTPS) material, can be used for manufacture more quickly and more small thin film transistor (TFT), suitable for liquid crystal display (LCD) and organic light emitting diodes (OLED) technology. Physical vapor deposition and plasma chemical vapor deposition strengthening thin film deposition system for panel industry to provide efficient, cost-effective way drive the advanced material production.
Applied Materials Group Vice President and display a career group general manager Tom Edelman said: "in the past 20 years, TFT technology to develop, promote the display industry is the most critical technical transformation. Applied Materials Company developed by the verification system product portfolio, assists our customer technical leap forward, and then application of these new films. Customers use our system to obtain excellent results, Applied Materials Company has won many orders of the main display manufacturers.
In view of the metal oxide TFT, applied materials' AKT - Pivot PVD systems use exclusive rotating cathode technology to deposit indium gallium zinc oxide (IGZO), it is with high electron mobility of new materials, capable of forming a transistor channel. Pivot system for display industry provides a powerful IGZO solutions, can overcome the influence of the display quality shows that inequality (mura effect) defects, this problem has made metal oxide technology not become the mainstream of the liquid crystal display. In addition, the Pivot of sedimentary indium gallium zinc oxide film broke through the TFT stability problems, ensure that the OLED can use metal oxide lagging, reducing the production cost greatly, let the economic benefits and detailed bright-coloured large OLED TV become possible.
Low temperature polycrystalline silicon (LTPS) technology is a proven method, can be used for manufacturing action LCD or OLED device of the highest resolution display screen, but has been faced with glass substrates amplification problems and unit manufacturing cost high challenge. Applied materials company's AT - PX plasma reinforcement chemical vapor deposition system of the new expansion series products, can be in 1.6 square metres to 5.7 square meters of glass substrate deposit out very uniform LTPS film. The increase of the substrate, so panel manufacturers to achieve economies of scale, improve productivity and reduce cost, but also let the world billions of consumers to enjoy the large LCD TV. Applied materials system used for large area glass manufacturing, also helps to accelerate the transformation of LTPS technology, let mobile device and television screen become bigger.
